Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system
نویسندگان
چکیده
This paper addresses issues related to cracking and blisters in deposited films encountered a lift-off process with electron beam evaporation bilayer PMMA resist system. The impact of charged particles, i.e. electrons ions, is investigated using an chamber equipped ring-magnets plate electrode placed front the sample. By replacing hollow cylinder, modified setup utilizing passive components allows complete elimination shrinkage blistering yielding near perfect deposition results for large variety different materials.
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ژورنال
عنوان ژورنال: Journal of vacuum science and technology
سال: 2021
ISSN: ['2166-2746', '2166-2754']
DOI: https://doi.org/10.1116/6.0001161